A vacuum deposition apparatus for depositing metal thin films or catalyst thin films on substrates with a high degree of accuracy and in a large quantity of samples.

Features:

?　Turbo-molecular pump is equipped so that clean vacuum is realized.

?　 All pumping processes run automatically only by pushing the start button.

?　Two kinds of metal sources can be alternately deposited.

? Highly-sensitive film-thickness monitor is equipped for sub-nanometer thin film deposition.

?　Our unique in-situ rotatable cubic sample holder gives 4 times increase of the yield per lot.

?　Special sample holder for sample preparation in a groove box is also possible optionally, by which samples will never be exposed to the air until the deposition process is finished.

Main Specifications:

Vacuum chamber
Pyrex glass chamber 210mmφ150mm.

Substrate holder
360°rotatale cubic substrate holder, 4 faces, 100mmx100mm for each face.

Evaporation source
2 sets of electrodes, 2 evaporation sources.

Vacuum system
Turbo molecular pump 67L/sec, rotary pump 38L/sec., penning gauge, automatic operation

Degree of vacuum
1×10-4Pa(7.5×10-7Torr)

Film thickness monitor
crystal oscillator, minimum 0.01nm, max. 100nm

Power requirement
220V, 200 Watt