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西安凱躍電子科技有限公司
西安凱躍電子科技有限公司
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更新時間：2022-08-27 10:44:24瀏覽次數：304次
聯(lián)系我時，請告知來自 環(huán)保在線紫外臭氧清洗儀（uv-ozone cleaner） 型號：JL-12
紫外臭氧清洗儀（uv-ozone cleaner） 型號：JL-12
儀器簡介：
UV cleaning machine JL-12 is one of our best selling UVO Cleaner units because of its compact design and affordable price which makes it perfect tool for small laboratories. As other listed models unit is equipped with two pair of media inlets with valves controlled by microprocessor.
技術參數：
Size(Max) 16.30" W x 28.00" D x 12.00" H
Power Requirements 220 Volts, 50 Hz., 10 Amps
Lamp Type Low Pressure Mercury Vapor Grid
Lamp Output 28,000 MicroWatts Per Sq. Cm @ 254nm
(From 6mm Dist.)
Tray Size 12" X 12" Exposure Area
主要特點：
Mainly used in liquid crystal display devices, semiconductor silicon wafers, integrated circuits, high-precision printed circuit boards, optical devices, quartz crystal, sealing technology, with the metal oxide materials used in the course of production such as light cleaning method is most appropriate.
The main base material: ITO glass, optical glass, chrome plate, mask, polish crystal, silicon chip and the metal oxide film with a precision cleaning treatment, etc.. The UV light source in the LCD process but also has UV modification (UV surface qualitative) features currently STN LCD production process, is mainly used in film processing technology, for improving the membrane and the membrane between the FN is very effective, such as ITO film and the photosensitive film layer, TOP coated with PI coating, etc.. The other can be used in the research department of plastic material products UV modified for nanotechnology research, product by the UV light irradiation a chemical reaction changes the surface properties of the product. STN-LCD, OLED and color filter production process, some very similar process equipment, the difference lies in the different manufacturing process requirements. With the refinement of line and color than products, LCD manufacturing process industry demands constant upgrading, UV Ozone cleaning devices can satisfy the technical requirements to achieve atomic-level degree
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